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              IN 
              THE NEWS: Berkeley Lab's EUV Lithography 
              By Phillip F. Schewe, Ben Stein, And James Riordon 
            
            Ultraviolet 
              Lithography can produce lines for integrated circuits as small as 
              39 nm. To help sustain Moore's law and cram more and more gates 
              and memory units into a given space, manufacturers of microchips 
              must make the lines in their circuitry ever smaller. This usually 
              means working with a shorter-wavelength light beam for creating 
              the patterns used for inscribing fine features on silicon or metal 
              surfaces. The form of lithography currently in mass production now 
              can produce a half-pitch size of 90 nm and isolated line widths 
              of 65  
              nm. To produce a later generation after that you would need even 
              shorter wavelengths. At Berkeley Labs Advanced Light Source, 
              a government-industry consortium of scientists is trying out this 
              future lithography. (2/13/03) Full 
              story.   
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